| | Mechanics of Solids A Journal of Russian Academy of Sciences | | Founded
in January 1966
Issued 6 times a year
Print ISSN 0025-6544 Online ISSN 1934-7936 |
Archive of Issues
Total articles in the database: | | 12804 |
In Russian (Èçâ. ÐÀÍ. ÌÒÒ): | | 8044
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In English (Mech. Solids): | | 4760 |
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<< Previous article | Volume 57, Issue 5 / 2022 | Next article >> |
N.A. Dyuzhev, E.E. Gusev, and M.A. Makhiboroda, "Study of the Mechanical Properties of Thin-Film Membranes Made of Oxide and Silicon Nitride," Mech. Solids. 57 (5), 1044-1053 (2022) |
Year |
2022 |
Volume |
57 |
Number |
5 |
Pages |
1044-1053 |
DOI |
10.3103/S002565442205017X |
Title |
Study of the Mechanical Properties of Thin-Film Membranes Made of Oxide and Silicon Nitride |
Author(s) |
N.A. Dyuzhev (National Research University of Electronic Technology (MIET), Zelenograd, Moscow, 124498 Russia)
E.E. Gusev (National Research University of Electronic Technology (MIET), Zelenograd, Moscow, 124498 Russia, bubbledouble@mail.ru)
M.A. Makhiboroda (National Research University of Electronic Technology (MIET), Zelenograd, Moscow, 124498 Russia) |
Abstract |
Thin-film membranes are made from alternating layers of silicon oxide and silicon nitride using a group technology. The influence of the number of layers constituting the membrane, while maintaining its thickness, on the value of mechanical strength has been studied. The burst pressure of a membrane structure 560 μm in diameter varies from 0.9 to 1.65 atm for 30 samples, depending on the number of membrane layers. The mechanical strength of the Si3N4/SiO2 structure varies from 10.5 to 19.2 GPa. It is shown that the region of discontinuity of the structure is localized at the membrane/substrate interface. |
Keywords |
mechanical strength, membranes, thin films, silicon oxide, silicon nitride |
Received |
11 January 2022 | Revised |
12 January 2022 | Accepted |
13 January 2022 |
Link to Fulltext |
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